The process of removing contaminants from the surface of electronic assemblies is critical to ensure optimal performance and longevity. These assemblies, essential components in numerous electronic devices, are susceptible to residue buildup that can compromise their functionality.
Effective contaminant removal enhances reliability, prevents premature failure, and maintains signal integrity. Historically, various methods have been employed, evolving from manual cleaning techniques to sophisticated automated systems, reflecting advancements in materials science and manufacturing processes.
